In a piece today at the Institute of Electrical and Electronics Engineers, Jan Van Schoot from ASML in the Netherlands describes the optics in their next generation of photolithography machines - what they refer to as a high-numerical aperture EUV system, the ASML EXE:5000.
Schoot states that, "The optics manufacturer Carl Zeiss has made a herculean effort to design and manufacture an anamorphic lens with the specifications required for our new machine."
Due to be released in 2025, these machines represent the current state-of-the-art on Earth of 3.3 million years of tool making.
For context, each of the current EUV machines reportedly has over 100,000 components, and they take 40 freight containers or four jumbo jets to ship. They cost around US$140 million each.
The ASML EXE:5000 is expected to cost about US$300 million apiece.
Intel CEO Pat Gelsinger has said the company expects to be the first recipient.
Article here :-
https://spectrum.ieee.org/high-na-euv
